Magnetron sputtering target

Sputtering coating is a coating technology that bombards a solid target with charged particles, so that atoms of the target are sputtered out and deposited on the surface of the substrate to form a thin film. In 1852, Grove discovered the phenomenon of cathode sputtering in the laboratory, which is recognized as the beginning of vacuum sputtering coating. From the current point of view, the development prospects of magnetron sputtering technology are very impressive. The two significant characteristics of slow target temperature rise and high deposition rate are widely used in the preparation of thin films of various materials. The physical mechanism of each process of magnetron sputtering Research is also becoming more and more important. As the main consumable part in vacuum coating, the characteristics of target are directly related to the quality of the film and the cost of coating. Therefore, how to improve the performance of the target and increase the utilization rate of the target has become an urgent problem in vacuum coating production. This article introduces the principle of magnetron sputtering, analyzes the latest research progress in structural design and optimization, and proposes the future development direction of magnetron sputtering technology.

The substrate is parallel to the target, and the target is connected to a negative potential, so the substrate is at a positive potential relative to the target. Introducing a magnetic field in the positive and negative poles, the electrons are affected by the electric field and the magnetic field, and move into a cycloid under the action of the Lorentz force F=e(v×B), which increases the probability of collision between the electrons and the inert gas, resulting in The ionization rate of argon atoms is greatly increased, and the Ar + density incident on the target surface gradually increases, which improves the sputtering rate. Since the sputtered neutral atoms are not restricted by the electric and magnetic fields, they fly to the substrate and form a thin film on the substrate. Magnetron sputtering has been applied to many industrial fields, especially in large-area flat glass.

Magnetron sputtering technology has become the dominant force in industrial coating due to its significant advantages. At present, the combination of magnetron sputtering technology and computer technology has become a research trend. Computer simulation not only reduces the research cost, but also visually observes the correlation of coatings. The physical process has important guiding significance for actual production.

In the future research field, the combination of magnetron sputtering technology, surface engineering technology, mechanical engineering and other technologies has become an inevitable trend. How to start with structural improvement and surface treatment to improve the surface material characteristics of the target, increase the heat exchange effect, and improve the target Material utilization and effectively improving the efficiency of target replacement in production lines have become the direction of future research.